Passivation layer comprising a photocrosslinked fluoropolymer
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United States of America Patent
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Jan 29, 2019
Grant Date -
Apr 27, 2017
app pub date -
May 27, 2015
filing date -
Jun 3, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
The present disclosure relates to a passivation layer comprising a photocrosslinked fluoropolymer and a process for forming the layer. Passivation layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorptivity and are able to be photoimaged so as to provide the very fine features needed for modern electronic equipment.
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International Classification(s)
- C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
- B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....
- C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
- C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
- G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
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