Method of treating gas and gas treatment device
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United States of America Patent
Stats
-
Jan 1, 2019
Grant Date -
Nov 16, 2017
app pub date -
May 9, 2017
filing date -
May 13, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Method of treating gas and gas treatment device, the gas treatment device comprising: a first chamber, comprising a first inlet, a first outlet and a first energy supply system, allowing the gas to enter the first chamber through the first inlet; a second chamber comprising a second outlet and a second energy supply system; a third chamber comprising a third inlet in communication with the first outlet and the second outlet; and a fourth chamber comprising a fourth inlet and a scrubbing system containing a solvent comprising water molecules (H2O), wherein the third outlet of the third chamber is in communication with the fourth inlet of the fourth chamber.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2017 Application Filing Year
- B01L Class
- 1829 Applications Filed
- 1204 Patents Issued To-Date
- 65.83 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- B01L Class
- 0 % this patent is cited more than
- 6 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jul 1, 2026 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 1, 2030 |
