Mold, method for producing mold, and method for producing nanoimprint film
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United States of America Patent
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Dec 18, 2018
Grant Date -
Dec 26, 2013
app pub date -
Mar 1, 2012
filing date -
Mar 11, 2011
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Abstract
A mold is disclosed, which is capable of producing a nanoimprint film without a problem of clogging of irregularities of the mold with a resin material. A method for producing the mold and a method for producing a nanoimprint film using the mold are further disclosed. In an embodiment, the mold includes: a first surface having a nanostructure including plural recesses spaced at an interval of less than 1 μm between bottom points of adjacent recesses; and at least two second surfaces substantially not having the nanostructure, wherein the first surface is coplanar with the at least two second surfaces and is positioned between two second surfaces.
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