Production of thin film solar grade silicon on metals by electrodeposition from silicon dioxide in a molten salt
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United States of America Patent
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Dec 4, 2018
Grant Date -
Apr 23, 2015
app pub date -
May 31, 2013
filing date -
May 31, 2012
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Abstract
A method of producing a silicon film includes: forming a deposition composition comprising silicon dioxide dispersed in a molten salt; placing a metal substrate and a counter electrode in the composition; and passing a reducing current between the metal substrate and the counter electrode, wherein the reducing current causes reduction of silicon dioxide particles to form a silicon film on the metal substrate.
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