Compositions and methods using same for carbon doped silicon containing films
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 4, 2018
Grant Date -
Jan 25, 2018
app pub date -
Feb 4, 2016
filing date -
Feb 6, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Described herein are compositions and methods using same for forming a silicon-containing film such as, without limitation, a carbon doped silicon oxide film, a carbon doped silicon nitride, a carbon doped silicon oxynitride film in a deposition process. In one aspect, the composition comprises at least cyclic carbosilane having at least one Si—C—Si linkage and at least one anchoring group selected from a halide atom, an amino group, and combinations thereof.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully