Anhydride copolymer top coats for orientation control of thin film block copolymers
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 27, 2018
Grant Date -
Dec 24, 2015
app pub date -
Aug 28, 2015
filing date -
Feb 10, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully