Liquid photoreactive composition and method of fabricating structures

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10133174
APP PUB NO 20160306277A1
SERIAL NO

15100577

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Abstract

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A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.

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Patent Owner(s)

Patent OwnerAddress
3M INNOVATIVE PROPERTIES COMPANYP O BOX 33427 ST PAUL MN 55133-3427

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DeVoe, Robert J Minnetonka, US 87 2728
Gates, Brian J Osceola, US 25 349
Lee, Tzu-Chen Woodbury, US 22 327
Nelson, Brian K Shoreview, US 30 488

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