Anti-ESD photomask and method of forming the same
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United States of America Patent
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Nov 13, 2018
Grant Date -
Jun 14, 2018
app pub date -
Jan 30, 2017
filing date -
Dec 8, 2016
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Abstract
The present disclosure provides an anti-ESD photomask and method of the same. In the method, a substrate is provided first. Then, a light-shielding layer is formed on a portion of the substrate, in which the light-shielding layer includes a Mo-containing layer. Next, a surface treatment operation is performed to convert a surface of the portion of the substrate and a surface of the light-shielding layer into a non-conductive layer.
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