Method for manufacturing crystal film
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United States of America Patent
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Oct 30, 2018
Grant Date -
Jun 15, 2017
app pub date -
Feb 28, 2017
filing date -
Jul 25, 2013
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Abstract
A method for manufacturing a crystal film including: forming a Zr film on a substrate heated to 700° C. or more by a vapor deposition method using a vapor deposition material having a Zr single crystal; forming a ZrO2 film on said Zr film on a substrate heated to 700° C. or more, by a vapor deposition method using said vapor deposition material having a Zr single crystal, and oxygen; and forming a Y2O3 film on said ZrO2 film on a substrate heated to 700° C. or more, by a vapor deposition method using a vapor deposition material having Y, and oxygen.
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