Inductively coupled plasma arc device
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United States of America Patent
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Oct 9, 2018
Grant Date -
Apr 16, 2015
app pub date -
Dec 4, 2014
filing date -
Feb 12, 2008
priority date (Note) -
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Abstract
An inductively coupled plasma device includes a rotary furnace tube and an inductively coupled plasma source. The rotary furnace tube has a first end, a second end and a longitudinal axis. In a first embodiment, the inductively coupled plasma source is disposed proximate to the first end of the rotary furnace tube and is aligned with the longitudinal axis of the rotary furnace such that the inductively coupled plasma source discharges a plasma into the rotary furnace tube. In a second embodiment, the inductively coupled plasma source is a ground electrode disposed within and aligned with the longitudinal axis of the rotary furnace tube, and a second electromagnetic radiation source disposed around or within the rotary furnace tube that generates a wave energy. The inductively coupled plasma source discharges a plasma within the rotary furnace tube.
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