Polishing pad and method for making the same
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United States of America Patent
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Sep 18, 2018
Grant Date -
Mar 31, 2016
app pub date -
Jul 14, 2015
filing date -
Sep 25, 2014
priority date (Note) -
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Abstract
The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a plurality of first trenches. The first trench has an opening at the first surface. The polishing layer is located on the first surface of the base layer and fills the first trenches. The polishing layer has a plurality of second trenches, the positions of the second trenches correspond to those of the first trenches, and the depth of the second trenches is less than that of the first trenches.
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