Lasing-gas mixture for excimer laser

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United States of America Patent

PATENT NO 10069273
SERIAL NO

15448023

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Abstract

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A xenon chloride (XeCl) excimer laser includes a lasing-gas mixture including a buffer gas, a noble gas, a halogen-donating gas, and deuterium. The deuterium is present in a concentration greater than about 10 parts-per-million.

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Patent Owner(s)

  • COHERENT LASERSYSTEMS GMBH & CO. KG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bragin, Igor Göttingen, DE 33 144
Melnikov, Oleg Göttingen, DE 18 60
Misyuryaev, Timur Göttingen, DE 2 0

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