Photomask and methods for manufacturing and correcting photomask

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10048580
APP PUB NO 20170075213A1
SERIAL NO

15341480

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the assist pattern while keeping the focal depth magnification effect as the assist pattern, and may form a transferred image having high contrast of a main pattern. A photomask is a photomask comprising the main pattern which is transferred to a transfer-target surface by the projection exposure and the assist pattern which is formed nearby the main pattern and not transferred, characterized in that the main pattern and the assist pattern are each constituted from a semi-transparent film made of the same material, a retardation of 180° is generated between the light transmitting through the main pattern and the light transmitting through a transparent region of a transparent substrate, and a predetermined retardation within the scope of 70° to 115° is generated between the light transmitting through the assist pattern and the light transmitting through the transparent region of the transparent substrate.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
DAI NIPPON PRINTING CO LTDTOKYO 162-8001

International Classification(s)

loading....
  • 2016 Application Filing Year
  • G03F Class
  • 1979 Applications Filed
  • 1508 Patents Issued To-Date
  • 76.21 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayano, Katsuya Tokyo-to, JP 39 636
Mohri, Hiroshi Tokyo-to, JP 29 466
Morikawa, Yasutaka Tokyo-to, JP 8 34
Nagai, Takaharu Tokyo-to, JP 13 37

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 2 Citation Count
  • G03F Class
  • 27.76 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges337785651245211201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 80100 +050100150200250300350400450500550600650700750800850

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Feb 14, 2026
11.5 Year Payment $7400.00 $3700.00 $1850.00 Feb 14, 2030