Photomask and methods for manufacturing and correcting photomask
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 14, 2018
Grant Date -
Mar 16, 2017
app pub date -
Nov 2, 2016
filing date -
Feb 16, 2009
priority date (Note) -
In Force
status (Latency Note)
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Importance

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Abstract
The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the assist pattern while keeping the focal depth magnification effect as the assist pattern, and may form a transferred image having high contrast of a main pattern. A photomask is a photomask comprising the main pattern which is transferred to a transfer-target surface by the projection exposure and the assist pattern which is formed nearby the main pattern and not transferred, characterized in that the main pattern and the assist pattern are each constituted from a semi-transparent film made of the same material, a retardation of 180° is generated between the light transmitting through the main pattern and the light transmitting through a transparent region of a transparent substrate, and a predetermined retardation within the scope of 70° to 115° is generated between the light transmitting through the assist pattern and the light transmitting through the transparent region of the transparent substrate.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
DAI NIPPON PRINTING CO LTD | TOKYO 162-8001 |
International Classification(s)

- 2016 Application Filing Year
- G03F Class
- 1979 Applications Filed
- 1508 Patents Issued To-Date
- 76.21 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Hayano, Katsuya | Tokyo-to, JP | 39 | 636 |
# of filed Patents : 39 Total Citations : 636 | |||
Mohri, Hiroshi | Tokyo-to, JP | 29 | 466 |
# of filed Patents : 29 Total Citations : 466 | |||
Morikawa, Yasutaka | Tokyo-to, JP | 8 | 34 |
# of filed Patents : 8 Total Citations : 34 | |||
Nagai, Takaharu | Tokyo-to, JP | 13 | 37 |
# of filed Patents : 13 Total Citations : 37 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 2 Citation Count
- G03F Class
- 27.76 % this patent is cited more than
- 7 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Feb 14, 2026 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Feb 14, 2030 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text

Legal Events
Date | Code | Event | Description |
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Feb 09, 2022 | MAFP | MAINTENANCE FEE PAYMENT | free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY year of fee payment: 4 |
Aug 14, 2018 | P | Publication | |
Jul 25, 2018 | STCF | INFORMATION ON STATUS: PATENT GRANT | free format text: PATENTED CASE |
Mar 16, 2017 | P | Published | |
Nov 02, 2016 | F | Filing | |
Feb 16, 2009 | PD | Priority Date |

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