Purification method and purification apparatus for off-gas

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United States of America Patent

PATENT NO 10016724
SERIAL NO

15113110

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Abstract

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The present invention relates to a purification method and a purification apparatus for off-gas. More specifically, the present invention relates to a purification method and a purification apparatus for off-gas, capable of lowering the concentration of hydrogen chloride and separating high-purity hydrogen from the off-gas, which is discharged after performing a polysilicon deposition process by a chemical vapor deposition reaction.

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Patent Owner(s)

Patent OwnerAddress
HANWHA CHEMICAL CORPORATIONSEOUL 04541

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Gui Ryong Daejeon, KR 14 39
Kim, Bo Kyung Daejeon, KR 30 119
Kim, Gil Ho Daejeon, KR 15 25
Kim, Sang ah Incheon, KR 7 6
Lee, Won Ik Bucheon-si, KR 11 29
Park, Jea Sung Daejeon, KR 5 4

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