SI-HAN ZENG
Inventor
Stats
- 1 US patents issued
- 5 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 1 US Patents Issued
- 5 US Applications Filed
- 32 Total Citation Count
- Jan 17, 2020 Most Recent Filing
- Apr 20, 2016 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| ASML NETHERLANDS B.V. | 2
| 2016
|
Inventor Addresses
| Address | Duration |
|---|---|
| Eindhoven, NL | Dec 23, 21 - Oct 24, 23 |
| New Taipei City, TW | Oct 27, 16 - Jun 21, 18 |
| New Taipei, TW | Jan 16, 18 - Nov 12, 19 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 2 |
| G01N: | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 4 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 11796978 | 2023 | Method for determining root causes of events of a semiconductor manufacturing process and for monitoring a semiconductor manufacturing process | 0 |
| 11774869 | 2023 | Method and system for determining overlay | 0 |
| 2022/0171,299 | 2022 | A METHOD AND SYSTEM FOR DETERMINING OVERLAY | 0 |
| 2021/0397,152 | 2021 | METHOD FOR DETERMINING ROOT CAUSES OF EVENTS OF A SEMICONDUCTOR MANUFACTURING PROCESS AND FOR MONITORING A SEMICONDUCTOR MANUFACTURING PROCESS | 2 |
| 10474043 | 2019 | Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method | 0 |
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