Xiawan Yang
Inventor
Stats
- 6 US patents issued
- 13 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 6 US Patents Issued
- 13 US Applications Filed
- 137 Total Citation Count
- Aug 16, 2023 Most Recent Filing
- Jun 7, 1999 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| EXXON CHEMICAL PATENTS INC. | 1
| 1999
|
| APPLIED MATERIALS, INC. | 4
| 2013
|
| Surfx Technologies LLC | 1
| 2005
|
| MICRON TECHNOLOGY, INC. | 2
2 2 | 2006
2009 2011 |
| EXXONMOBIL CHEMICAL PATENTS INC. | 1
| 1999
|
Inventor Addresses
| Address | Duration |
|---|---|
| Beijing, CN | Sep 02, 03 - Sep 02, 03 |
| Boise, ID | Jul 20, 06 - Feb 28, 08 |
| Boise, ID, US | May 26, 09 - Jul 29, 14 |
| San Jose, CA, US | Apr 09, 15 - Feb 20, 25 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B01J: | CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS | 2 |
| B44C: | PRODUCING DECORATIVE EFFECTS | 1 |
| C23C: | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL | 3 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2025/0062,131 | 2025 | PLASMA ETCHING IN SEMICONDUCTOR PROCESSING | 0 |
| 2025/0054,768 | 2025 | METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES | 0 |
| 2025/0054,770 | 2025 | METHODS OF ETCHING OXYGEN-CONTAINING FEATURES AT LOW TEMPERATURES | 0 |
| 11935751 | 2024 | Boron nitride for mask patterning | 0 |
| 2022/0384,189 | 2022 | BORON NITRIDE FOR MASK PATTERNING | 0 |
We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level.
>
Upgrade to our Level for up to -1 portfolios!.