Masako Yamakawa
Inventor
Stats
- 7 US patents issued
- 10 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 7 US Patents Issued
- 10 US Applications Filed
- 66 Total Citation Count
- Mar 14, 2017 Most Recent Filing
- Aug 7, 1995 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
JAPAN PIONICS CO., LTD. | 1
1 | 1995
1997 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. | 7
1 4 | 2012
2014 2016 |
Inventor Addresses
Address | Duration |
---|---|
Hiratsuka, JP | Sep 09, 97 - Mar 06, 18 |
Hiratsuka-shi, JP | Sep 04, 14 - Jun 29, 17 |
Kanagawa, JP | Dec 31, 15 - Aug 13, 19 |
Technology Profile
Technology | Matters | |
---|---|---|
B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
C07C: | ACYCLIC OR CARBOCYCLIC COMPOUNDS | 7 |
C07D: | HETEROCYCLIC COMPOUNDS | 5 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
10377734 | 2019 | Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition | 8 |
9908831 | 2018 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | 11 |
2017/0183,279 | 2017 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | 10 |
9598392 | 2017 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | 0 |
9540339 | 2017 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | 10 |
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