Naoto YONEMARU
Inventor
Stats
- 0 US patents issued
- 2 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 2 US Applications Filed
- 0 Total Citation Count
- Jan 30, 2023 Most Recent Filing
- Feb 16, 2021 Earliest Filing
Work History
No Work History Available.Inventor Addresses
| Address | Duration |
|---|---|
| Tokyo, JP | Mar 02, 23 - Dec 19, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 2 |
| H01L: | SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2024/0419,064 | 2024 | PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | 0 |
| 2023/0069,092 | 2023 | MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK | 0 |
We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level.
>
Upgrade to our Level for up to -1 portfolios!.