Johannes Weichart
Inventor
Stats
- 0 US patents issued
- 6 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 6 US Applications Filed
- 15 Total Citation Count
- Mar 28, 2022 Most Recent Filing
- Apr 19, 2013 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
ETH ZURICH | 1
| 2013
|
DISNEY ENTERPRISES, INC. | 1
| 2013
|
DISNEY RESEARCH ZURICH | 1
| 2013
|
Inventor Addresses
Address | Duration |
---|---|
Balers, LI | Mar 19, 15 - Mar 19, 15 |
Balzers, LI | Nov 07, 19 - Aug 29, 23 |
Zürich, CH | Jun 06, 24 - Jun 06, 24 |
Technology Profile
Technology | Matters | |
---|---|---|
B64B: | LIGHTER-THAN-AIR AIRCRAFT | 1 |
B64D: | EQUIPMENT FOR FITTING IN OR TO AIRCRAFT; FLYING SUITS; PARACHUTES; ARRANGEMENTS OR MOUNTING OF POWER PLANTS OR PROPULSION TRANSMISSIONS | 1 |
C23C: | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL | 3 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2024/0183,724 | 2024 | SENSOR SYSTEM FOR A THREE-DIMENSIONAL DEVICE | 0 |
11742187 | 2023 | RF capacitive coupled etch reactor | 0 |
11217434 | 2022 | RF capacitive coupled dual frequency etch reactor | 1 |
2021/0202,282 | 2021 | METHOD AND APPARATUS FOR TREATING A SUBSTRATE | 2 |
2020/0312,624 | 2020 | RF CAPACITIVE COUPLED DUAL FREQUENCY ETCH REACTOR | 1 |
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