Johannes Wangler

Inventor

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Work History

Patent OwnerApplications FiledYear
Imperial Research LLC
1
2003
Carl Zeiss SMT AG and ASML Netherlands
1
2005
Carl-Zeiss-Stiftung
1
1
2
1
1999
2000
2002
2004
CARL ZEISS LASER OPTICS GMBH
2
2012
CARL ZEISS SMT GMBH
1
1
3
6
1
16
7
7
4
10
5
9
2
5
2
8
9
1
1999
2000
2001
2002
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2014
2015
2017
Carl Ziess SMT AG
1
2000
ASML NETHERLANDS B.V.
4
2
1
2002
2005
2006
Carl Zeiss Semiconductor
1
2002
Zeiss, Carl
1
1999
Carl Zeiss
1
2008
CARL ZEISS SMT AG
1
1
2
1
1
3
13
8
9
10
3
6
1
3
1990
1992
1994
1995
1996
1999
2001
2002
2003
2004
2005
2006
2007
2008

Inventor Addresses

AddressDuration
Königsbronn, DEAug 09, 05 - Mar 21, 06
Kōnigsbronn, DEDec 28, 04 - Dec 28, 04
Königsbronn, DEJan 06, 09 - Jan 25, 11
Koenigsbronn, DESep 12, 02 - Mar 24, 20
Kongsbronn, DESep 25, 01 - Sep 25, 01
Konigsbronn, DEAug 20, 91 - Oct 28, 08
Koningsbronn, DEMar 27, 08 - Mar 27, 08
Konnigsbronn, DEJan 20, 04 - Jan 20, 04
Kunigsbronn, DEOct 07, 97 - Oct 07, 97

Technology Profile

Technology Matters
A61G: TRANSPORT, PERSONAL CONVEYANCES, OR ACCOMMODATION SPECIALLY ADAPTED FOR PATIENTS OR DISABLED PERSONS 1
A61N: ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 4
B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
105990412020Facet mirror1
101461352018Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation0
2018/0246,4152018METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS4
100189172018Illumination optical unit for EUV projection lithography1
99461612018Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method1

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