Toshiyuki Uno

Inventor

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Work History

Patent OwnerApplications FiledYear
Murata Kikai Kabushiki Kaisha
1
1
1
1988
1989
1994
ASAHI GLASS COMPANY, LIMITED
2
2
5
4
2
4
4
1
2001
2004
2006
2010
2011
2012
2013
2017

Inventor Addresses

AddressDuration
Chiyoda-ku, JPNov 28, 13 - Apr 09, 19
Fukushima, JPMar 10, 22 - Jan 02, 25
Guilderland, NYJun 12, 07 - Oct 18, 07
Guilderland, NY, USJan 12, 06 - Jun 14, 11
Kanagawa, JPMay 07, 02 - May 07, 02
Koriyama, JPJul 11, 23 - Jul 16, 24
Koriyama-shi, JPOct 21, 21 - Sep 28, 23
Kusatsu, JPDec 26, 89 - Dec 31, 96
Tokyo, JPDec 02, 10 - Feb 04, 25
Yokohama-shi, JPMar 21, 02 - Apr 19, 07

Technology Profile

Technology Matters
B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM 1
C03B: MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL 1
C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
122163972025Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof0
122163982025Reflective mask blank and reflective mask0
2025/0004,3602025REFLECTIVE MASK BLANK AND REFLECTIVE MASK0
121241642024Reflective mask blank and reflective mask0
2024/0241,4332024REFLECTIVE MASK BLANK AND REFLECTIVE MASK0

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