KEISHI TSUKIYAMA
Inventor
Stats
- 0 US patents issued
- 5 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 5 US Applications Filed
- 2 Total Citation Count
- Nov 13, 2024 Most Recent Filing
- May 18, 2023 Earliest Filing
Work History
No Work History Available.Inventor Addresses
| Address | Duration |
|---|---|
| Tokyo, JP | Oct 12, 23 - Feb 27, 25 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B22F: | WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER | 1 |
| C22C: | ALLOYS | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 4 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2025/0065,403 | 2025 | METHOD FOR PRODUCING MAGNETIC PARTICLES, MAGNETIC PARTICLES, AND PERMANENT MAGNET USING THE SAME | 0 |
| 2025/0004,360 | 2025 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | 0 |
| 12124164 | 2024 | Reflective mask blank and reflective mask | 0 |
| 2024/0241,433 | 2024 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | 0 |
| 2024/0210,814 | 2024 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME | 0 |
We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level.
>
Upgrade to our Level for up to -1 portfolios!.