Tony Quan Tran

Inventor

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Work History

Patent OwnerApplications FiledYear
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
2
5
2
2001
2015
2016
DOW GLOBAL TECHNOLOGIES LLC
5
2
2015
2016

Inventor Addresses

AddressDuration
Bear, DE, USDec 29, 16 - Feb 28, 23
Newark, DEAug 05, 03 - Aug 05, 03
Newark, DE, USNov 08, 01 - Nov 08, 01

Technology Profile

Technology Matters
B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 14
B24D: TOOLS FOR GRINDING, BUFFING, OR SHARPENING 5
B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
115914952023Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten0
2021/0163,7872021NEUTRAL TO ALKALINE CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS FOR TUNGSTEN0
109952382021Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten0
108576472020High-rate CMP polishing method0
108617022020Controlled residence CMP polishing method0

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