Edric H Tong
Inventor
Stats
- 2 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 2 US Patents Issued
- 4 US Applications Filed
- 190 Total Citation Count
- Sep 18, 2023 Most Recent Filing
- May 18, 1988 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| TENCOR INSTRUMENTS | 1
| 1988
|
| TOKYO ELECTRON LIMITED | 3
| 2001
|
Inventor Addresses
| Address | Duration |
|---|---|
| Santa Cruz, CA | Mar 13, 90 - Mar 13, 90 |
| Sunnyvale, CA | Feb 14, 02 - Jun 03, 03 |
| Sunnyvale, CA, US | May 30, 02 - Feb 27, 25 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B24B: | MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING | 1 |
| B65H: | HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES | 1 |
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2025/0069,859 | 2025 | APPARATUS TO IMPROVE PROCESS NON-UNIFORMITY FOR SEMICONDUCTOR DIRECT PLASMA PROCESSING | 0 |
| 6572456 | 2003 | Bathless wafer measurement apparatus and method | 0 |
| 2002/0065,028 | 2002 | Bathless wafer measurement apparatus and method | 0 |
| 2002/0018,217 | 2002 | Optical critical dimension metrology system integrated into semiconductor wafer process tool | 105 |
| 4907931 | 1990 | Apparatus for handling semiconductor wafers | 33 |
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