Toshihiro TOJO
Inventor
Stats
- 1 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 1 US Patents Issued
- 4 US Applications Filed
- 10 Total Citation Count
- May 2, 2023 Most Recent Filing
- Apr 20, 2012 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| RENAULT S.A.S. | 1
| 2012
|
| TOKYO ELECTRON LIMITED | 2
1 | 2012
2013 |
Inventor Addresses
| Address | Duration |
|---|---|
| Nirasaki City, JP | Oct 25, 12 - Aug 24, 23 |
| Nirasaki, JP | Jan 10, 17 - Nov 26, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 1 |
| C23C: | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL | 1 |
| H01J: | ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS | 3 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12154760 | 2024 | Inductively-coupled plasma processing apparatus | 0 |
| 2023/0268,160 | 2023 | ANTENNA UNIT FOR INDUCTIVELY COUPLED PLASMA, INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD THEREFOR | 0 |
| 2020/0227,236 | 2020 | Inductively-Coupled Plasma Processing Apparatus | 2 |
| 9543121 | 2017 | Inductively coupled plasma processing apparatus | 1 |
| 2013/0200,043 | 2013 | ANTENNA UNIT FOR INDUCTIVELY COUPLED PLASMA, INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD THEREFOR | 3 |
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