Tomonori Takahashi

Inventor

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Work History

Patent OwnerApplications FiledYear
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
4
2
6
1
1
2012
2013
2014
2015
2016
Nippon Petrochemicals Company, Limited
1
1
1992
1993
HENKEL AG & CO. KGAA
1
2016
TACHI-S CO., LTD.
2
2015
FUJIFILM CORPORATION
1
2
4
2
2
4
2
2009
2010
2011
2012
2013
2014
2015
NGK INSULATORS, LTD.
2
1
1
6
4
2
2
3
2
3
6
2
7
6
1
2
4
4
1
2
2
1
1
1983
1985
1986
1987
1988
1990
1991
1992
1993
1994
1995
1996
1997
1998
1999
2000
2001
2002
2005
2006
2007
2013
2017
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
1
2013

Inventor Addresses

AddressDuration
Aichi, JPNov 22, 94 - Nov 22, 94
Chigasaki, JPOct 26, 93 - Sep 20, 94
Chita, JPMay 31, 88 - Aug 09, 22
Chita-City, JPJun 19, 03 - Feb 04, 21
Chita-Shi, JPMar 13, 25 - Mar 13, 25
Chita-city, JPJul 17, 03 - Sep 13, 07
Gilbert, AZ, USApr 23, 15 - Dec 05, 17
Granada Hills, CA, USNov 24, 20 - Nov 24, 20
Haibara-gun, JPSep 29, 11 - Apr 01, 25
Kanagawa, JPJul 02, 24 - Jul 02, 24
Mesa, AZ, USSep 13, 12 - Nov 26, 19
Mesa, JPMar 13, 14 - Mar 13, 14
Nagoya, JPSep 17, 85 - Oct 30, 07
Nagoya-City, JPApr 18, 02 - Sep 13, 07
Nagoya-shi, JPFeb 06, 14 - Feb 06, 14
Shizuoka, JPMar 31, 11 - Feb 25, 25
Shizuoka-ken, JPJul 01, 10 - Jul 01, 10
Tokyo, JPDec 08, 16 - Jun 23, 20
UTSUNOMIYA-SHI, JPOct 12, 23 - Oct 12, 23
Wako, JPJun 27, 17 - Jun 27, 17
Wako-shi, JPMay 05, 16 - May 05, 16
Yokohama, JPSep 24, 20 - Sep 19, 24

Technology Profile

Technology Matters
B01D: SEPARATION 14
B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 3
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
122642752025Treatment liquid0
2025/0086,3632025POROUS BODY DESIGN METHOD AND POROUS BODY MANUFACTURING METHOD0
122343992025Chemical solution, method for manufacturing chemical solution, and method for treating substrate0
2024/0425,7542024COMPOSITION FOR MANUFACTURING SEMICONDUCTOR, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT0
2024/0400,9492024COMPOSITION, COMPOUND, RESIN, SUBSTRATE TREATMENT METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE0

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