Tomotaka Tsuchimura

Inventor

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Work History

Patent OwnerApplications FiledYear
FUJI PHOTO FILM CO., LTD.
2
1
7
5
2003
2004
2005
2006
FUJITSU Corporation
1
2012
FUJIFILM CORPORATION
2
2
2
1
7
6
9
8
20
17
17
12
11
16
7
12
2
2001
2002
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2014
2015
2016
2017

Inventor Addresses

AddressDuration
Shizuoka-kenJPJan 15, 09 - Jan 15, 09
Haibara-gun, JPJun 29, 06 - Jun 20, 24
Kanagawa, JPJan 05, 17 - Jan 05, 17
SHIZUOKA, JPDec 17, 15 - Jan 21, 16
Shizouka, JPJul 15, 14 - Jul 15, 14
Shizuoka, JPNov 06, 03 - Mar 14, 23
Shizuoka-ken, JPAug 29, 02 - Nov 25, 14
Yoshida-cho, JPNov 24, 16 - Nov 24, 16

Technology Profile

Technology Matters
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING 1
B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2024/0201,5892024ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE0
2024/0192,5922024ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND0
116044122023Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device0
114674892022Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device0
108023992020Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device2

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