Chester J Sobodacha
Inventor
Stats
- 10 US patents issued
- 10 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 10 US Patents Issued
- 10 US Applications Filed
- 65 Total Citation Count
- Aug 5, 1996 Most Recent Filing
- May 2, 1986 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| AZ ELECTRONIC MATERIALS USA CORP. | 1
1 2 1 1 | 1986
1988 1992 1993 1996 |
| CLARIANT FINANCE (BVI) LIMITED | 1
1 1 1 | 1986
1988 1989 1991 |
Inventor Addresses
| Address | Duration |
|---|---|
| Coventry, RI | Mar 22, 88 - Jul 08, 97 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| C07C: | ACYCLIC OR CARBOCYCLIC COMPOUNDS | 3 |
| C08F: | MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 1 |
| C08G: | MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 5646218 | 1997 | Novolak resin blends for photoresist applications | 3 |
| 5374693 | 1994 | Novolak resin blends for photoresist applications | 11 |
| 5348842 | 1994 | Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride | 1 |
| 5221592 | 1993 | Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester | 4 |
| 5162510 | 1992 | Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer | 5 |
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