Masashi Shima

Inventor

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Work History

Patent OwnerApplications FiledYear
FUJITSU MICROELECTRONICS LIMITED
1
2005
SOCIONEXT INC.
2
2
2
2
2
2
2
2005
2009
2010
2013
2014
2015
2016
FUJITSU LIMITED
1
1
2
2
2
1995
2000
2001
2002
2005
FUJITSU SEMICONDUCTOR LIMITED
2
2
14
4
6
3
9
10
10
7
13
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013

Inventor Addresses

AddressDuration
Kawasaki, JPJan 07, 97 - Jan 09, 18
Kuwana, JPJul 18, 13 - Mar 18, 14
Yokohama, JPSep 23, 10 - Sep 01, 15

Technology Profile

Technology Matters
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1
H01L: SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 58
H03F: AMPLIFIERS 1

Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
98657342018Semiconductor device and fabrication method thereof0
2017/0117,4122017SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF0
95770982017Semiconductor device and fabrication method thereof0
2016/0308,0532016SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF0
94014272016Semiconductor device and fabrication method thereof0

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