Ronald J Schutz
Inventor
Stats
- 14 US patents issued
- 16 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 14 US Patents Issued
- 16 US Applications Filed
- 234 Total Citation Count
- Mar 23, 2006 Most Recent Filing
- Aug 21, 1984 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| AT&T Bell Laboratories | 2
2 1 1 | 1989
1990 1991 1993 |
| INFINEON TECHNOLOGIES AG | 1
1 1 | 2000
2005 2006 |
| BELL TELEPHONE LABORATORIES, INCORPORATED | 1
2 1 | 1984
1989 1991 |
| INTERNATIONAL BUSINESS MACHINES CORPORATION | 1
2 1 1 | 1998
1999 2000 2005 |
| QIMONDA AG | 2
| 1999
|
| AGERE SYSTEMS GUARDIAN CORP. | 1
| 1991
|
| AGERE SYSTEMS INC. | 1
1 | 1988
1991 |
| AMERICAN TELEPHONE AND TELEGRAPH COMPANY | 1
1 2 2 2 | 1984
1988 1989 1990 1991 |
| INFINEON TECHNOLOGIES NORTH AMERICA CORP. | 1
| 1998
|
| AT&T Labs, Inc. | 1
| 1988
|
| SAMSUNG ELECTRONICS CO., LTD. | 1
| 1998
|
| TOSHIBA MEMORY CORPORATION | 1
| 1999
|
Inventor Addresses
| Address | Duration |
|---|---|
| 14 Upper Warren Way, Warren, NJ 07060 | Sep 22, 92 - Sep 22, 92 |
| Austin, TX | Nov 24, 92 - Nov 24, 92 |
| Dresden, DE | Jan 05, 06 - Sep 27, 07 |
| Millbrook, NY | Mar 14, 00 - Jul 16, 02 |
| Warren, NJ | Jul 14, 87 - Sep 07, 93 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B44C: | PRODUCING DECORATIVE EFFECTS | 2 |
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 4 |
| H01L: | SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | 16 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2007/0221,613 | 2007 | Structure for stopping mechanical cracks in a substrate wafer, use of the structure and a method for producing the structure | 11 |
| 2006/0001,162 | 2006 | Nitride and polysilicon interface with titanium layer | 7 |
| 6420267 | 2002 | Method for forming an integrated barrier/plug for a stacked capacitor | 3 |
| 6358850 | 2002 | Slurry-less chemical-mechanical polishing of oxide materials | 3 |
| 6303506 | 2001 | Compositions for and method of reducing/eliminating scratches and defects in silicon dioxide during CMP process | 7 |
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