Thorsten Schedel

Inventor

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Work History

Patent OwnerApplications FiledYear
INFINEON TECHNOLOGIES AG
1
1
2004
2005
Advanced Mask Technology Center GmbH & Co. KG
1
2016
NXP USA, INC.
2
2
2002
2003
QIMONDA AG
2
1
2003
2007
SAMSUNG ELECTRONICS CO., LTD.
2
2002
POLARIS INNOVATIONS LIMITED
6
8
2
2
2
2002
2003
2004
2005
2008
MOTOROLA, INC.
2
2003

Inventor Addresses

AddressDuration
Dresden, DEMay 02, 02 - Dec 27, 22

Technology Profile

Technology Matters
B27N: MANUFACTURE BY DRY PROCESSES OF ARTICLES, WITH OR WITHOUT ORGANIC BINDING AGENTS, MADE FROM PARTICLES OR FIBRES CONSISTING OF WOOD OR OTHER LIGNOCELLULOSIC OR LIKE ORGANIC MATERIAL 1
B29D: PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE 1
B41J: TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
115370392022Photomask assembly with reflective photomask and method of manufacturing a reflective photomask0
2020/0225,5712020Photomask Assembly with Reflective Photomask and Method of Manufacturing a Reflective Photomask1
100314092018Reflective photomask and reflection-type mask blank0
2017/0108,7662017REFLECTIVE PHOTOMASK AND REFLECTION-TYPE MASK BLANK2
80979552012Interconnect structures and methods11

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