Michihiro Shirakawa

Inventor

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Work History

Patent OwnerApplications FiledYear
FUJIFILM CORPORATION
5
3
8
7
11
9
11
15
2009
2010
2012
2013
2014
2015
2016
2017

Inventor Addresses

AddressDuration
Haibara-gun, JPDec 31, 09 - Mar 13, 25
Haibara-gun, Shizuoka, JPJan 09, 14 - Oct 14, 21
Hiabara-gun, JPJan 11, 18 - Jan 11, 18
Shizuoka, JPOct 01, 09 - Jul 11, 24

Technology Profile

Technology Matters
B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM 3
B82Y: SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES 1
C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS 11

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2025/0085,6282025PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE0
2025/0044,7002025PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE0
2025/0004,3742025ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE0
2024/0427,2432024ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE0
2024/0402,6012024ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND0

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