Bruno W Schueler
Inventor
Stats
- 7 US patents issued
- 20 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 7 US Patents Issued
- 20 US Applications Filed
- 164 Total Citation Count
- May 27, 2024 Most Recent Filing
- Oct 23, 1989 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
INTEL CORPORATION | 2
| 2005
|
HIGH VOLTAGE ENGINEERING CORPORATION | 1
1 | 1989
1996 |
NOVA MEASURING INSTRUMENTS INC. | 1
1 2 2 2 2 2 1 | 1989
1996 2005 2009 2011 2013 2014 2017 |
Inventor Addresses
Address | Duration |
---|---|
2208 Glenkirk Dr., San Jose, CA 95124 | Jun 10, 97 - Jun 10, 97 |
Redwood City, CA | Jul 07, 92 - Jul 07, 92 |
San Jose, CA | Jul 15, 08 - Jul 15, 08 |
San Jose, CA, US | Mar 29, 07 - Jan 02, 25 |
Technology Profile
Technology | Matters | |
---|---|---|
B23P: | OTHER WORKING OF METAL; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS | 1 |
B23Q: | DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING | 1 |
G01D: | MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR | 1 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2025/0006,451 | 2025 | PATTERNED X-RAY EMITTING TARGET | 0 |
12165863 | 2024 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | 0 |
2024/0345,006 | 2024 | SYSTEM AND METHOD FOR MEASURING A SAMPLE BY X-RAY REFLECTANCE SCATTEROMETRY | 0 |
11996259 | 2024 | Patterned x-ray emitting target | 0 |
2024/0087,869 | 2024 | SYSTEMS AND APPROACHES FOR SEMICONDUCTOR METROLOGY AND SURFACE ANALYSIS USING SECONDARY ION MASS SPECTROMETRY | 0 |
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