Shoichi Saitoh
Inventor
Stats
- 6 US patents issued
- 14 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 6 US Patents Issued
- 14 US Applications Filed
- 66 Total Citation Count
- Dec 21, 2016 Most Recent Filing
- Oct 15, 1992 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| KREI, SENTO | 1
| 1992
|
| MITSUBISHI PENCIL COMPANY, LIMITED | 1
| 2014
|
| FUJIFILM CORPORATION | 3
4 5 2 1 2 | 2011
2012 2013 2014 2015 2016 |
| Sento Krei | 1
| 1992
|
Inventor Addresses
| Address | Duration |
|---|---|
| Fujioka-shi, JP | Oct 09, 14 - Oct 09, 14 |
| Haibara-gun, JP | Feb 02, 12 - Oct 06, 16 |
| Haibara-gun, Shizuoka, JP | Jan 09, 14 - Jan 09, 14 |
| Shizuoka, JP | Mar 01, 12 - Apr 13, 17 |
| Tokyo, JP | Aug 30, 94 - Aug 30, 94 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| A45C: | PURSES; LUGGAGE; HAND CARRIED BAGS | 1 |
| B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
| B65D: | CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2017/0102,618 | 2017 | METHOD OF FORMING PATTERN | 0 |
| 9523913 | 2016 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | 1 |
| 9482947 | 2016 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | 0 |
| 2016/0291,461 | 2016 | PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD | 2 |
| 9316910 | 2016 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | 0 |
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