Norbert Rosenkranz
Inventor
Stats
- 5 US patents issued
- 6 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 5 US Patents Issued
- 6 US Applications Filed
- 23 Total Citation Count
- Aug 28, 2010 Most Recent Filing
- Jul 24, 2003 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
CARL ZEISS SMT GMBH | 2
2 1 1 | 2004
2008 2009 2010 |
CARL ZEISS MICROELECTRONIC SYSTEMS GMBH | 2
| 2003
|
CARL ZEISS SMS GMBH | 1
| 2004
|
Inventor Addresses
Address | Duration |
---|---|
Reichenbach, DE | Oct 28, 04 - Mar 03, 15 |
Technology Profile
Technology | Matters | |
---|---|---|
G02B: | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS | 5 |
G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 1 |
G06K: | RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS | 1 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
8970951 | 2015 | Mask inspection microscope with variable illumination setting | 0 |
RE44216 | 2013 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | 0 |
8264535 | 2012 | Method and apparatus for analyzing a group of photolithographic masks | 0 |
2010/0157,046 | 2010 | METHOD AND APPARATUS FOR ANALYZING A GROUP OF PHOTOLITHOGRAPHIC MASKS | 2 |
7286284 | 2007 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | 9 |
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