Markus Renno
Inventor
Stats
- 2 US patents issued
- 10 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 2 US Patents Issued
- 10 US Applications Filed
- 197 Total Citation Count
- Jun 9, 2010 Most Recent Filing
- Sep 5, 2003 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| SCHOTT AG | 2
5 3 | 2003
2004 2005 |
| INTERNATIONAL BUSINESS MACHINES CORPORATION | 2
| 2003
|
| THE INVENTION SCIENCE FUND I, LLC | 1
| 2006
|
| SCHOTT SOLAR AG | 1
| 2010
|
| SCHOTT GLASS | 2
| 2003
|
Inventor Addresses
| Address | Duration |
|---|---|
| Jena, DE | Dec 16, 10 - Dec 16, 10 |
| Meinigen, DE | Sep 01, 05 - Sep 01, 05 |
| Meiningen, DE | Nov 25, 04 - Apr 14, 09 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B05D: | PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL | 2 |
| B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 4 |
| C08J: | WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2010/0313,943 | 2010 | Thin-film solar cell and process for producing it | 4 |
| 7517617 | 2009 | Mask blank for use in EUV lithography and method for its production | 6 |
| 2007/0128,528 | 2007 | Mask blank and photomask having antireflective properties | 40 |
| 2007/0076,833 | 2007 | Attenuated phase shift mask blank and photomask | 42 |
| 2006/0115,744 | 2006 | Method of producing a mask blank for photolithographic applications, and mask blank | 8 |
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