Sangchol PARK

Inventor

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Inventor Addresses

AddressDuration
Suwon-si, KRApr 15, 21 - Jan 23, 25

Technology Profile

Technology Matters
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3

Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2025/0028,2362025HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS0
2023/0221,6412023HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS0
2021/0109,4492021HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS0

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