Tetsuo Okayasu
Inventor
Stats
- 7 US patents issued
- 12 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 7 US Patents Issued
- 12 US Applications Filed
- 56 Total Citation Count
- Oct 5, 2021 Most Recent Filing
- Jun 10, 2003 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| AZ Electronic Material (Luxembourg) S.ár.l. | 1
| 2013
|
| AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. | 1
5 1 | 2013
2014 2015 |
| MERCK PATENT GMBH | 1
1 2 2 | 2003
2004 2005 2012 |
| SAMSUNG ELECTRONICS CO., LTD. | 3
| 2014
|
| AZ ELECTRONIC MATERIALS USA CORP. | 1
| 2016
|
| AZ Electronics Materials (Luxembourg) S.A.R.L. | 2
| 2014
|
Inventor Addresses
| Address | Duration |
|---|---|
| Kakegawa, JP | Jun 29, 10 - Jun 04, 24 |
| Kakegawa-shi, JP | May 28, 15 - Nov 23, 23 |
| Ogasa-gun, JP | Dec 23, 10 - Dec 23, 10 |
| Shizouka, JP | Nov 10, 16 - Nov 10, 16 |
| Shizuoka, JP | Oct 06, 05 - Nov 07, 17 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B05D: | PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL | 1 |
| C07C: | ACYCLIC OR CARBOCYCLIC COMPOUNDS | 1 |
| C08F: | MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 11999827 | 2024 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | 0 |
| 11866554 | 2024 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | 0 |
| 2023/0374,226 | 2023 | POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICEOUS FILM USING THE SAME | 0 |
| 2023/0303,775 | 2023 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | 0 |
| 2023/0174,724 | 2023 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | 0 |
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