Naofumi Ohashi
Inventor
Stats
- 40 US patents issued
- 148 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 40 US Patents Issued
- 148 US Applications Filed
- 995 Total Citation Count
- Oct 31, 2024 Most Recent Filing
- Jul 28, 1998 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
HITACHI, LTD. | 1
1 | 2000
2001 |
SONY CORPORATION | 3
| 2005
|
HITACHI HIGH-TECHNOLOGIES CORPORATION | 1
| 2012
|
RENESAS ELECTRONICS CORPORATION | 1
2 2 28 2 2 2 2 | 1998
1999 2000 2002 2003 2006 2008 2010 |
Hitachi Koskusai Electric Inc. | 1
| 2011
|
ROHM CO., LTD. | 1
| 2005
|
SANYO ELECTRIC CO., LTD. | 4
| 2004
|
HITACHI KOKUSAI ELECTRIC INC. | 2
1 2 3 7 11 4 | 2009
2012 2013 2014 2015 2016 2017 |
RENESAS TECHNOLOGY CORP. | 3
1 | 2002
2004 |
Hitachi Kokusai Elecetric, Inc. | 1
| 2015
|
RenesasTechnology Corp. | 1
| 2002
|
Inventor Addresses
Address | Duration |
---|---|
Hanno, JP | Dec 04, 01 - Mar 08, 05 |
Hanno-shi, JP | Feb 28, 02 - Jan 02, 03 |
Hannou, JP | Feb 06, 01 - Mar 06, 12 |
Hannou-shi, JP | May 16, 02 - Jun 03, 10 |
TOYAMA, JP | Jan 07, 21 - Jan 07, 21 |
Tokyo, JP | Oct 28, 04 - Oct 04, 12 |
Toyama, JP | Apr 28, 15 - Apr 10, 25 |
Toyama-shi, JP | Oct 15, 15 - Apr 10, 25 |
Tsukuba, JP | May 15, 03 - May 30, 06 |
Technology Profile
Technology | Matters | |
---|---|---|
B05D: | PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL | 1 |
B08B: | CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL | 1 |
B24B: | MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING | 3 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2025/0118,591 | 2025 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, SUBSTRATE TRANSFER APPARATUS, AND SUBSTRATE PROCESSING APPARATUS | 0 |
2025/0115,996 | 2025 | Substrate Processing Method, Method of Manufacturing Semiconductor Device, Non-transitory Computer-readable Recording Medium and Substrate Processing Apparatus | 0 |
2025/0079,231 | 2025 | SUBSTRATE PROCESSING APPARATUS, ROTATION STATE DETECTION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | 0 |
2025/0054,794 | 2025 | PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM | 0 |
12224185 | 2025 | Method of manufacturing semiconductor device | 0 |
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