Satoyuki Nomura

Inventor

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Work History

Patent OwnerApplications FiledYear
SUMITOMO CHEMICAL COMPANY, LIMITED
2
2004
HITACHI CHEMICAL COMPANY, LTD.
1
1
14
2
1
6
4
4
1
2001
2002
2004
2005
2006
2009
2010
2011
2014
MAXDEM INCORPORATED
5
2
2004
2005

Inventor Addresses

AddressDuration
Chiyoda-ku, Tokyo, JPJun 28, 18 - Oct 07, 21
IBARAKI, JPJun 16, 11 - Jun 16, 11
Ibaraki, JPJul 13, 04 - Dec 22, 11
Tokyo, JPNov 06, 18 - Mar 13, 25
Tsukuba, JPApr 24, 07 - May 14, 19
Tsukuba-shi, JPApr 20, 06 - May 29, 14

Technology Profile

Technology Matters
B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2025/0084,2942025SLURRY AND POLISHING METHOD0
2024/0425,7372024SLURRY, SCREENING METHOD, AND POLISHING METHOD0
121732192024Slurry and polishing method0
121041122024Slurry, screening method, and polishing method0
2021/0309,8842021SLURRY, SCREENING METHOD, AND POLISHING METHOD0

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