Daria Negri
Inventor
Stats
- 8 US patents issued
- 36 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 8 US Patents Issued
- 36 US Applications Filed
- 257 Total Citation Count
- Jun 13, 2024 Most Recent Filing
- Aug 31, 2010 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| KLA—Tencor Corporation | 1
| 2016
|
| KLA-TENCOR CORPORATION | 2
4 6 2 1 2 | 2010
2011 2013 2014 2015 2016 |
Inventor Addresses
| Address | Duration |
|---|---|
| Haifa, IL | Jun 07, 18 - Dec 10, 24 |
| Milpitas, CA, US | Aug 29, 24 - Aug 29, 24 |
| Nesher, IL | Mar 24, 11 - Mar 18, 25 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| F21V: | FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR | 3 |
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 16 |
| G01J: | MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12253805 | 2025 | Scatterometry overlay metrology with orthogonal fine-pitch segmentation | 0 |
| 12222199 | 2025 | Systems and methods for measurement of misregistration and amelioration thereof | 0 |
| 12170215 | 2024 | Systems and methods for correction of impact of wafer tilt on misregistration measurements | 0 |
| 12165930 | 2024 | Adaptive modeling misregistration measurement system and method | 0 |
| 12131959 | 2024 | Systems and methods for improved metrology for semiconductor device wafers | 0 |
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