Takahisa Namiki
Inventor
Stats
- 39 US patents issued
- 43 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 39 US Patents Issued
- 43 US Applications Filed
- 798 Total Citation Count
- Aug 13, 2010 Most Recent Filing
- Nov 15, 1990 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| HOECHST CELANESE CORPORATION | 1
| 1996
|
| FUJITSU LIMITED | 1
1 5 3 1 3 3 2 13 5 2 7 4 2 2 2 4 | 1990
1993 1996 1997 1998 1999 2000 2001 2002 2003 2004 2005 2006 2007 2008 2009 2010 |
| MITSUBISHI RAYON CO., LTD. | 1
1 | 1996
1997 |
| FUJITSU SEMICONDUCTOR LIMITED | 1
2 | 1994
2004 |
Inventor Addresses
| Address | Duration |
|---|---|
| Atsugi, JP | Aug 31, 93 - Jan 16, 96 |
| KAWASAKI-SHI, JP | Jul 05, 01 - Jul 05, 01 |
| Kanagawa, JP | Apr 18, 00 - Aug 12, 03 |
| Kawasaki, JP | Jan 09, 96 - Jan 08, 13 |
| Kawasaki-shi, JP | Jun 14, 01 - Sep 10, 09 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
| B44C: | PRODUCING DECORATIVE EFFECTS | 3 |
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 3 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 8349542 | 2013 | Manufacturing process of semiconductor device | 1 |
| 8334091 | 2012 | Resist pattern swelling material, and method for patterning using same | 6 |
| 8198014 | 2012 | Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same | 1 |
| 8198009 | 2012 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same | 0 |
| 2010/0305,248 | 2010 | RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME | 1 |
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