Keigo Nishida
Inventor
Stats
- 3 US patents issued
- 23 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 3 US Patents Issued
- 23 US Applications Filed
- 68 Total Citation Count
- Dec 19, 2024 Most Recent Filing
- Oct 25, 1996 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
RIKEN | 1
| 2006
|
KANEKA CORPORATION | 1
| 1996
|
MITSUBISHI HITACHI POWER SYSTEMS, LTD. | 1
| 2015
|
MITSUBISHI HITACHI POWERS SYSTEMS, LTD. | 1
| 2015
|
NICHIA CORPORATION | 1
| 2017
|
HITACHI KOKUSAI ELECTRIC INC. | 1
1 1 | 2011
2013 2015 |
FUSO PHARMACEUTICAL INDUSTRIES, LTD. | 1
| 1999
|
MITSUBISHI HEAVY INDUSTRIES, LTD. | 1
| 2010
|
Inventor Addresses
Address | Duration |
---|---|
Anan, JP | Sep 01, 20 - Sep 01, 20 |
Anan-shi, JP | Dec 21, 17 - May 18, 23 |
Higashi-Osaka, JP | Jan 09, 01 - Jan 09, 01 |
Kahoku-county, JP | Jun 13, 13 - May 30, 17 |
Kanagawa, JP | Aug 13, 09 - Aug 13, 09 |
Otsu, JP | Feb 27, 01 - Feb 27, 01 |
Tokyo, JP | Apr 26, 12 - Jan 29, 19 |
Toyama, JP | Oct 01, 20 - Jan 28, 25 |
Toyama-shi, JP | Aug 25, 11 - Apr 10, 25 |
Technology Profile
Technology | Matters | |
---|---|---|
A61K: | PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES | 1 |
B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
C07D: | HETEROCYCLIC COMPOUNDS | 1 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2025/0115,993 | 2025 | SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | 0 |
2025/0118,549 | 2025 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE CAPABLE OF CONTROLLING FILM THICKNESS DISTRIBUTION | 0 |
12211689 | 2025 | Method of manufacturing semiconductor device capable of controlling film thickness distribution | 0 |
2024/0318,306 | 2024 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | 0 |
2024/0321,596 | 2024 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS | 0 |
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