C Joseph Mogab

Inventor

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Work History

Patent OwnerApplications FiledYear
FREESCALE SEMICONDUCTOR, INC.
1
1
1
1
1992
1993
1994
1998
NXP USA, INC.
1
1998
APPLE INC.
1
1
1992
1994

Inventor Addresses

AddressDuration
Austin, TXOct 19, 93 - Oct 02, 01

Technology Profile

Technology Matters
C23F: NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 1
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2
H01G: CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
62971692001Method for forming a semiconductor device using a mask having a self-assembled monolayer22
60279612000CMOS semiconductor devices and method of formation192
55106511996Semiconductor device having a reducing/oxidizing conductive material116
54647111995Process for fabricating an X-ray absorbing mask28
54078551995Process for forming a semiconductor device having a reducing/oxidizing conductive material60

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