Jan Andries MEIJER
Inventor
Stats
- 4 US patents issued
- 5 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 4 US Patents Issued
- 5 US Applications Filed
- 14 Total Citation Count
- May 30, 2019 Most Recent Filing
- Nov 14, 2011 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| MAPPER LITHOGRAPHY IP B.V. | 2
2 2 1 | 2011
2012 2013 2014 |
Inventor Addresses
| Address | Duration |
|---|---|
| Rotterdam, NL | Nov 22, 12 - Nov 21, 23 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B82Y: | SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES | 4 |
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| RE49732 | 2023 | Charged particle lithography system with alignment sensor and beam measurement sensor | 0 |
| 9665014 | 2017 | Charged particle lithography system with alignment sensor and beam measurement sensor | 0 |
| 9240306 | 2016 | Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device | 0 |
| 2015/0179,398 | 2015 | CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH SENSOR ASSEMBLY | 0 |
| 9030675 | 2015 | Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus | 3 |
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