Ian Moncrieff

Inventor

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Work History

Patent OwnerApplications FiledYear
MONCRIEFF, IAN
1
2007
AVIZA EUROPE LIMITED
1
2003
SPTS TECHNOLOGIES LIMITED
2
1
2
1
2001
2012
2016
2017
Montcrieff, Ian
1
2007

Inventor Addresses

AddressDuration
Marlborough, NZApr 15, 10 - Jul 24, 18
NEWPORT, GBMar 19, 20 - Mar 19, 20
Newport, GBJan 11, 24 - Feb 27, 24
South Gloucestershire, GBMar 18, 04 - Mar 18, 04
South Gouces, GBDec 06, 22 - Dec 06, 22
WICKWAR, GBFeb 21, 13 - Feb 21, 13
WOTTON-UNDER-EDGE SOUTH GLOUCESTERSHIRE, GBOct 12, 17 - Aug 12, 21
WOTTON-UNDER-EDGE, GBDec 29, 16 - Oct 25, 18
Wickwar, GBMay 01, 18 - May 01, 18
Wotton-Under-Edge, GBDec 11, 18 - Apr 16, 24
Wotton-under-Edge South Gloucestershire, GBAug 18, 16 - Aug 18, 16
Wotton-under-Edge, GBOct 25, 01 - May 18, 21

Technology Profile

Technology Matters
B81B: MICRO-STRUCTURAL DEVICES OR SYSTEMS, e.g. MICRO-MECHANICAL DEVICES 2
C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE 1
C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 9

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
119617222024Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition0
119131092024Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour deposition0
2024/0014,0182024Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition0
117189082023DC magnetron sputtering0
2023/0094,6992023Method and Apparatus for Controlling Stress Variation in a Material Layer Formed Via Pulsed DC Physical Vapor Deposition0

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