David Lou
Inventor
Stats
- 0 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 4 US Applications Filed
- 16 Total Citation Count
- Aug 15, 2019 Most Recent Filing
- Jul 11, 2007 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| LAM RESEARCH AG | 1
| 2016
|
| LAM RESEARCH CORPORATION | 1
1 | 2007
2012 |
Inventor Addresses
| Address | Duration |
|---|---|
| Jhubei City, TW | Aug 27, 09 - May 10, 12 |
| Villach, AT | Mar 08, 18 - May 31, 22 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B08B: | CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL | 1 |
| C09K: | MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR | 1 |
| C23F: | NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 11345852 | 2022 | Etchant composition | 0 |
| 2021/0277,308 | 2021 | ETCHANT COMPOSITION | 0 |
| 10483010 | 2019 | Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment | 0 |
| 2018/0068,754 | 2018 | REDUCTION OF SURFACE AND EMBEDDED SUBSTRATE CHARGE BY CONTROLLED EXPOSURE TO VACUUM ULTRAVIOLET (VUV) LIGHT IN LOW-OXYGEN ENVIRONMENT | 3 |
| 2012/0115,332 | 2012 | Method of Post Etch Polymer Residue Removal | 0 |
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