Weihong Liu
Inventor
Stats
- 7 US patents issued
- 34 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 7 US Patents Issued
- 34 US Applications Filed
- 114 Total Citation Count
- May 30, 2024 Most Recent Filing
- May 31, 2007 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. | 6
1 | 2012
2015 |
| MERCK PATENT GMBH | 2
| 2007
|
| ICL-IP AMERICA INC. | 1
2 | 2007
2008 |
| AZ ELECTRONIC MATERIALS USA CORP. | 1
2 1 | 2007
2008 2011 |
| TELEFONAKTIEBOLAGET L M ERICSSON (PUBL) | 2
| 2011
|
| THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2
1 | 2007
2015 |
Inventor Addresses
| Address | Duration |
|---|---|
| Beijing, CN | Nov 14, 13 - Feb 02, 16 |
| Branchburg, NJ, US | Feb 28, 19 - Jan 23, 25 |
| Bridgewater, NJ, US | Feb 05, 09 - Jul 07, 20 |
| Dalian City, CN | May 21, 20 - May 21, 20 |
| Dalian, CN | Jul 20, 21 - Jul 20, 21 |
| Dobbs Ferry, NY, US | Jun 03, 10 - Jun 03, 10 |
| Kanata, CA | Aug 18, 22 - Aug 06, 24 |
| Nanjing, CN | Nov 07, 19 - Sep 15, 20 |
| San Francisco, CA | Jun 05, 08 - Jun 05, 08 |
| San Francisco, CA, US | Apr 21, 15 - Sep 07, 23 |
| Shanghai, CN | Jul 16, 20 - Jun 22, 21 |
| Shenzhen, CN | Dec 05, 24 - Dec 05, 24 |
| Yuyao City, Ningbo, Zhejiang, CN | Jun 27, 24 - Jun 27, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| A61K: | PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES | 4 |
| A63B: | APPARATUS FOR PHYSICAL TRAINING, GYMNASTICS, SWIMMING, CLIMBING, OR FENCING; BALL GAMES; TRAINING EQUIPMENT | 1 |
| B01D: | SEPARATION | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2025/0028,245 | 2025 | POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION | 0 |
| 2024/0401,759 | 2024 | IMITATION-SHAPED LAMP | 0 |
| 12058534 | 2024 | Method of measuring AAS EMF | 0 |
| 2024/0209,917 | 2024 | Internal Magnetic Control Device, Flywheel Assembly and Fitness Equipment | 0 |
| 11822242 | 2023 | DNQ-type photoresist composition including alkali-soluble acrylic resins | 0 |
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