Chun-Neng LIN

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Work History

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Inventor Addresses

AddressDuration
HSIN-CHU, TWFeb 17, 22 - Jun 22, 23
HSINCHU COUNTY, TWNov 25, 21 - Nov 10, 22
Hsin-Chu, TWFeb 21, 23 - Feb 21, 23
Hsin-chu, TWDec 28, 23 - Dec 28, 23
Hsinchu City, TWApr 14, 22 - Oct 24, 24
Hsinchu County, TWDec 26, 19 - Dec 31, 24
Hsinchu, TWFeb 04, 21 - Feb 25, 25

Technology Profile

Technology Matters
B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 2
C09K: MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR 2
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
122374002025Method of forming semiconductor device0
121838232024Fin field-effect transistor with a gate structure having a dielectric protection layer0
2024/0371,9622024SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME0
2024/0371,6882024SEMICONDUCTOR DEVICE WITH DOPED REGION DIELECTRIC LAYER0
121365662024Semiconductor device and method of manufacture0

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