Sooyong LEE

Inventor

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Work History

Patent OwnerApplications FiledYear
SAMSUNG ELECTRONICS CO., LTD.
1
2016

Inventor Addresses

AddressDuration
Gyeonggi-do, KRSep 30, 21 - Sep 30, 21
Seoul, KRMay 04, 17 - Jul 09, 19
Suwon-si, KROct 12, 23 - Mar 20, 25
YONGIN-SI, KRJul 22, 21 - Oct 12, 23
Yongin-si, KRMay 07, 20 - Sep 17, 24

Technology Profile

Technology Matters
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 9
G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS 2
G06F: ELECTRIC DIGITAL DATA PROCESSING 13

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2025/0094,6802025ELECTRONIC DEVICE SUPPORTING MANUFACTURE OF SEMICONDUCTOR DEVICE AND OPERATING METHOD OF ELECTRONIC DEVICE0
2025/0076,7722025RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVICE CONSTRUCTION SYSTEM0
2024/0377,9882024MEMORY DEVICE AND OPERATION METHOD THEREOF0
2024/0320,4122024PROCESS PROXIMITY CORRECTION METHOD BASED ON DEEP LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD COMPRISING THE PROCESS PROXIMITY CORRECTION METHOD0
2024/0319,5802024PROCESS PROXIMITY CORRECTION METHOD BASED ON MACHINE LEARNING, OPTICAL PROXIMITY CORRECTION METHOD INCLUDING THE SAME, AND METHOD OF MANUFACTURING MASK BY USING THE PROCESS PROXIMITY CORRECTION METHOD0

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